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CHEMOTEC PAD POLISHING CLOTH



Quantity:   
Soft synthetic chemically resistant no nap pad removes smears from tough materials. Used with aluminum oxide powders, colloidal silica suspensions and 1 micron and finer diamond products for final polishing on titanium, stainless, lead/tin solders, electronic packages and soft non-ferrous plastics.

EQUIVALENT TO: BUEHLER CHEMOMET

COTTON POLISHING CLOTH



Quantity:   
Very short nap 100% cotton cloth. Used for rough polishing on soft materials with Metlab diamond compounds and alumina.

EQUIVALENT TO: BUEHLER MET CLOTH

DIA-DAC POLISHING CLOTH



Quantity:   
Napless woven pure medium hard silk cloth of very close weave. Used with 6 to 1 micron diamond in pre-polishing stages on ferrous and non-ferrous materials, petrographic samples and ceramics.

EQUIVALENT TO: STRUERS DP DAC

DIA-MOL POLISHING CLOTH



Quantity:   
Woven wool medium / soft for use wiyh 6 to 1 micron diamond on ferrous and non-ferrous metals. Can also be used for final polishing on all metals with aluminum oxide powders.

EQUIVALENT TO: STRUERS DP MOL

DIA-NAP POLISHING CLOTH



Quantity:   
Soft very short napped synthetic cloth for use in final polishing with 1 micron and finer diamond on all ferrous metals and sintered carbides.

EQUIVALENT TO: STRUERS DP NAP

DIA-PLAN POLISHING CLOTH



Quantity:   
Napless woven pure nylon cloth of close weave. Used with 15 to 3 micron diamond to prevent relief and maintain flatness on hard / very hard materials.

EQUIVALENT TO: STRUERS DP PLAN

DIA-PLUS POLISHING CLOTH



Quantity:   
Soft long napped synthetic cloth for use with 3 micron and finer diamond on ferrous metals and sintered carbides. Can also be used for final polishing on all materials with aluminum oxide powders.

EQUIVALENT TO: STRUERS DP PLUS

GOLD LABEL



Quantity:   
Nap-free nylon with plastic backing used with diamond 15-3 micron. Provides excellent flatness.

METLAB (MICRO) POLISHING CLOTH



Quantity:   
Short synthetic rayon fibers to a woven cotton backing giving a soft suede cloth of hard wearing properties. Use with Metlab diamond compounds and for final polishing on all materials with aluminum oxide powders.

EQUIVALENT TO: BUEHLER MICRO CLOTH AND LECO LE CLOTH

PAN W POLISHING CLOTH



Quantity:   
Synthetic chemotextile hard napless material which has oil / water resistant backing. Used with 3 micron or finer diamond compounds to maintain flatness, edge and inclusion retention in pre-polishing stages on metals, ceramics etc.

EQUIVALENT TO: BUEHLER TEXMET 1000

RED FELT POLISHING CLOTH



Quantity:   
100% pure virgin wool fabric plucked rather than sheared pile. Used for general rough polishing with aluminas on all materials.

SELVYT POLISHING CLOTH



Quantity:   
A very short piled cloth made entirely from cotton. Used with alumina and magnesia powders when polishing very soft materials.

VEL LAP POLISHING CLOTH



Quantity:   
A white synthetic velvet cloth. Its short nap provides an excellent polish with minimal relief and edge roundness. Used for final polishing of soft metals with aluminas, diamond and colloidal silica suspensions.

EQUIVALENT TO: BUEHLER MASTER - TEX

 

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BOX 1075 - 4011 HYDE PARK BOULEVARD NIAGARA FALLS, NY. 14302-1075 TEL:800-828-6866 FAX:716-282-6971 EMAIL